Descripción del proyecto
Caracterización de dispositivos nanoelectrónicos en tiempo real
La producción fiable de dispositivos nanoelectrónicos innovadores requiere un control en línea continuo y en tiempo real. Las herramientas de metrología necesarias para caracterizar de manera precisa los productos a las escalas pertinentes de uno a cientos de nanómetros aún están por desarrollar. Las técnicas de espectroscopia más recientes (como la espectroscopia Raman, infrarroja y de fotoluminiscencia) que mapean los observables físicos a nanoescala no tienen la suficiente resolución para hacer una caracterización detallada de los nanodispositivos. El proyecto CHALLENGES, financiado con fondos europeos, mejorará tanto la resolución espacial como la relación señal/ruido de estas técnicas aprovechando el fenómeno óptico de la resonancia de plasmones superficiales localizada. Las técnicas espectroscópicas mejoradas con plasmones garantizarán la fabricación y el rendimiento fiables de los dispositivos nanoelectrónicos. El proyecto demostrará las nuevas técnicas en tres áreas: semiconductores, dispositivos fotovoltaicos de silicio y materiales 2D.
Objetivo
A cost-efficient production of reliable, innovative materials and devices like advanced electronics products (<65 nm strained channel transistors, CMOS image sensors) requires nanoscale real-time in-line control, nowadays not available, during manufacturing. State-of-the-art techniques capable to map physical observables at the nanoscale compatible with in-line operations, like Raman, InfraRed (IR), Photoluminescence (PL) spectroscopy, do not have typically enough resolution for the detailed characterization of nano-scaled devices. Signal amplification by localized plasmon resonance at a sharp tip can give the opportunity of improving both the spatial resolution and the signal/noise ratio. CHALLENGES main objective is to develop multipurpose nano-optical techniques and metrological protocols for real-time characterization, using plasmonic enhanced Raman, IR and PL signals, capable to enable an increase of speed, sensitivity, spectral range with full cleanroom compatibility within different production environments, to improve devices performance, quality and reliability. CHALLENGES will focus on development and demonstration of such technology on three relevant application contexts: Semiconductor Industry, Si Photovoltaics and 2D Materials. Overall, the envisaged results are expected to be applicable to many other industrial fields in which the materials control at the nanoscale is required, spanning from those others electronics-related (DRAM, non-volatile memory, MEMS) to those one materials science (additive manufacturing, nanocoatings) and life sciences (implants, softmatter apps) related. CHALLENGES is coordinated by a large silicon foundry company and it is strongly driven by industrial and applicative needs. The Consortium includes renowned EU research labs with top-class facilities and capacities, industry leading enterprises and innovative SMEs with a worldwide collaboration network that will boost the international dimension and impact of the project.
Ámbito científico
- engineering and technologynanotechnologynano-materialstwo-dimensional nanostructures
- engineering and technologyelectrical engineering, electronic engineering, information engineeringelectronic engineeringsensors
- engineering and technologymechanical engineeringmanufacturing engineeringadditive manufacturing
- medical and health sciencesmedical biotechnologyimplants
- engineering and technologyenvironmental engineeringenergy and fuelsrenewable energysolar energyphotovoltaic
Palabras clave
Programa(s)
Convocatoria de propuestas
Consulte otros proyectos de esta convocatoriaConvocatoria de subcontratación
H2020-NMBP-TO-IND-2019
Régimen de financiación
RIA - Research and Innovation actionCoordinador
00185 Roma
Italia