Description du projet
Caractériser en temps réel des dispositifs nanoélectroniques
Une production fiable de dispositifs nanoélectroniques innovants requiert un contrôle continu, intégré et en temps réel. Pour caractériser avec précision ces produits aux échelles pertinentes, de l’ordre d’un à plusieurs centaines de nanomètres, il nous reste encore à développer les outils de métrologie nécessaires. Les techniques de spectroscopie de pointe (comme les spectroscopies Raman, infrarouge et de photoluminescence) qui cartographient les éléments physiques observables à l’échelle nanométrique ne possèdent pas une résolution suffisante pour permettre une caractérisation détaillée des nanodispositifs. Le projet CHALLENGES, financé par l’UE, améliorera à la fois la résolution spatiale et le rapport signal/bruit de ces techniques en exploitant le phénomène optique de la résonance de plasmons de surface localisés. Les techniques spectroscopiques améliorées par les plasmons garantiront la fiabilité de la fabrication ainsi que les performances des dispositifs nanoélectroniques. Le projet procèdera à la démonstration de ces nouvelles techniques dans trois domaines: les semi-conducteurs, le photovoltaïque en silicium et les matériaux 2D.
Objectif
A cost-efficient production of reliable, innovative materials and devices like advanced electronics products (<65 nm strained channel transistors, CMOS image sensors) requires nanoscale real-time in-line control, nowadays not available, during manufacturing. State-of-the-art techniques capable to map physical observables at the nanoscale compatible with in-line operations, like Raman, InfraRed (IR), Photoluminescence (PL) spectroscopy, do not have typically enough resolution for the detailed characterization of nano-scaled devices. Signal amplification by localized plasmon resonance at a sharp tip can give the opportunity of improving both the spatial resolution and the signal/noise ratio. CHALLENGES main objective is to develop multipurpose nano-optical techniques and metrological protocols for real-time characterization, using plasmonic enhanced Raman, IR and PL signals, capable to enable an increase of speed, sensitivity, spectral range with full cleanroom compatibility within different production environments, to improve devices performance, quality and reliability. CHALLENGES will focus on development and demonstration of such technology on three relevant application contexts: Semiconductor Industry, Si Photovoltaics and 2D Materials. Overall, the envisaged results are expected to be applicable to many other industrial fields in which the materials control at the nanoscale is required, spanning from those others electronics-related (DRAM, non-volatile memory, MEMS) to those one materials science (additive manufacturing, nanocoatings) and life sciences (implants, softmatter apps) related. CHALLENGES is coordinated by a large silicon foundry company and it is strongly driven by industrial and applicative needs. The Consortium includes renowned EU research labs with top-class facilities and capacities, industry leading enterprises and innovative SMEs with a worldwide collaboration network that will boost the international dimension and impact of the project.
Champ scientifique
- engineering and technologynanotechnologynano-materialstwo-dimensional nanostructures
- engineering and technologyelectrical engineering, electronic engineering, information engineeringelectronic engineeringsensors
- engineering and technologymechanical engineeringmanufacturing engineeringadditive manufacturing
- medical and health sciencesmedical biotechnologyimplants
- engineering and technologyenvironmental engineeringenergy and fuelsrenewable energysolar energyphotovoltaic
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Régime de financement
RIA - Research and Innovation actionCoordinateur
00185 Roma
Italie