Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
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Autori:
Kevin M. Dorney, Nicola N. Kissoon, Fabian Holzmeier, Esben W. Larsen, Dhirendra P. Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. W. van der Heide, John S. Petersen
Pubblicato in:
Proceedings of SPIE, Volume 12494, Optical and EUV Nanolithography XXXVI, Numero 12494, 2023, 2023, Pagina/e 1249407
Editore:
SPIE
DOI:
10.1117/12.2658359
A scientific framework for establishing ultrafast molecular dynamic research in imec's AttoLab
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Autori:
Laura Galleni, Faegheh S. Sajjadian, Theirry Conard, Ivan Pollentier, Kevin M. Dorney, Fabian Holzmeier, Esben Witting Larsen, Daniel Escudero, Geoffrey Pourtois, Michiel J. van Setten, Paul van der Heide, John S. Petersen
Pubblicato in:
Proceedings of SPIE, Volume 12498, Advances in Patterning Materials and Processes XL, Numero 124980W, 2023, 2023, Pagina/e 124980W
Editore:
SPIE
DOI:
10.1117/12.2660047