Atomic layer deposition (ALD) has long been a Key Enabling Technology in mainstream 300 mm semiconductor production. In recent years, ALD has seen increasing adoption in More-than-Moore technologies outside 300 mm main semiconductor market. In SALADIN project, Picosun P-300F ALD tool is validated for industrial use in MEMS foundry environment in collaboration with Silex Microsystems and Pegasus Chemicals. The target is to show that a single ALD system can fulfill the coating needs of a MEMS foundry’s multiple devices by meeting film property and quality requirements, wide portfolio of different materials and processes as well as productivity requirements and cost targets for final devices. Additionally, two new ALD applications for MEMS will be demonstrated. In the project, an all-European value chain for MEMS production from equipment and chemicals supply to component manufacturing is created to strengthen the European semiconductor industry.
The main work streams of SALADIN project are WP2, WP3, WP4, WP5, WP6 and WP7 representing
WP2: Tool manufacturing
WP3: ALD process development
WP4: Tool integration
WP5: Process flow integration
WP6: Application properties optimization
WP7: Foundry evaluation
WP1 and WP8 are Ethics requirements and Dissemination, exploitation and general management, respectively.