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Metrology Advances for Digitized ECS industry 4.0

Descrizione del progetto

Nuove tecnologie metrologiche rivoluzionano l’industria europea dei semiconduttori

La metrologia rappresenta gli occhi e le orecchie di molte industrie tra cui quella dei semiconduttori. Per qualsiasi sistema di misurazione elettronico, esiste un compromesso tra sensibilità, precisione e accuratezza. Il progetto MADEin4, finanziato dall’UE, svilupperà nuove soluzioni di Industria 4.0 per l’industria manifatturiera europea dei semiconduttori al fine di superare questa barriera. Collegando quasi 50 produttori europei e organizzazioni di ricerca e tecnologia, il progetto sta lavorando a sistemi ciberfisici avanzati e altamente connessi utilizzando un nuovo approccio Industria 4.0 che combina analisi dei dati metrologici e progettazione con metodologie di apprendimento automatico e gemellaggio digitale. Progettato per favorire la crescita dei semiconduttori e dell’industria automobilistica europea, MADEin4 agevolerà l’accesso pre-commerciale dei produttori a campioni di prova collegandoli con grandi organizzazioni di ricerca e tecnologia.

Obiettivo

The metrology domain (which could be considered as the ‘eyes and ears’ for both R&D&I and production) is a key enabler for productivity enhancements in many industries across the electronic components and system (ECS) value chain and have to be an integral part of any Cyber Physical Systems (CPS) which consist of metrology equipment, virtual metrology or Industrial internet of things (IIoT) sensors, edge and high-performance computing (HPC). The requirements from the metrology is to support ALL process steps toward the final product. However, for any given ECS technology, there is a significant trade-off between the metrology sensitivity, precision and accuracy to its productivity. MADEin4 address this deficiency by focusing on two productivity boosters which are independent from the sensitivity, precision and accuracy requirements: • Productivity booster 1: High throughput, next generation metrology and inspection tools development for the nanoelectronics industry (all nodes down to 5nm). This booster will be developed by the metrology equipment’s manufacturers and demonstrated in an industry 4.0 pilot line at imec and address the ECS equipment, materials and manufacturing major challenges (MASP Chapter 15, major challenges 1 – 3). • Productivity booster 2: CPS development which combines Machine Learning (ML) of design (EDA) and metrology data for predictive diagnostics of the process and tools performances predictive diagnostics of the process and tools performances (predictive yield and tools performance). This booster will be developed and demonstrated in an industry 4.0 pilot line at imec, for the 5nm node, by the EDA, computing and metrology partners (MASP Chapter 15, major challenge 4). The same CPS concept will be demonstrated for the ‘digital industries’ two major challenges of the nanoelectronics (all nodes down to 5nm) and automotive end user’s partners (MASP Chapter 9, major challenges 1and 3).

Meccanismo di finanziamento

IA - Innovation action

Coordinatore

APPLIED MATERIALS ISRAEL LTD
Contribution nette de l'UE
€ 2 608 045,90
Indirizzo
OPPENHEIMER STREET 9
76705 Rehovot
Israele

Mostra sulla mappa

Tipo di attività
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Collegamenti
Costo totale
€ 13 040 229,50

Partecipanti (48)