Sonstige Dokumente
- SNM short Youtube-like video for publication & EC public presentation
- Report on metrology benchmarking
- Nanopatterning utilizing physical vapor deposited films
- Parallel operation of small cantilever arrays
- RT QD devices
- Nanometer precise 3D patterns
- Helium Ion beam lithography & limits for SNL
- RT SE devices
- Evalutation report about tailored molecular glass resists
- Electrical characteristics of patterned MoS2 and another related 2D semiconductor
- Evalutation report about tailored molecular glass resists
- Silicon nanowire based mechanical resonators as mass sensors
- Installation of AFM in SEM
- RT SE devices
- Deliver scalability study over range 15-200 nm for hole patterning into SiO2
- Nanopatterns of different chemical compositions by changing the liquid bridge
- Measurements on SNM patterned material using TEM, AFM & FIB
- Demonstration of large area multi-beam fabrication of SN structures
- Performance demonstration of high-resolution 3D AFM
- E-beam transparent Si3N4 supports
- Parallel operation of small cantilever arrays
- Initial SE and QD devices
- Evaluation report on SPL-patterning of organic/inorganic hybrid molecular resist (h-MR) films
- Template growth of organic and biological molecules onto nanopatterns
- Evaluation report on SPL-based patterning of organic molecular resist (MR) films
- 200/300 mm prototype tool for atomic layer etching with demonstrated processes
- Pattern transfer capabilities of ALD (selective/non-selective) for SNL-patterned molecular resist
- Comparative study of molecular resist modification by plasma exposure
- Methodology for traceable characterization of probe-sample interaction and probe shape
- Silicon nanowire based FETs as biochemical sensors
- Successful demonstration of proof-of-concept of scanning probe alignment
- Prototype beam splitting optics/blanker plate chip stack in SEM.
- Report:"More-than-Moore" / beyond CMOS device demonstrator fabricated by SNM integrated process flow
- Press release on SNM at project end
- Statistical report on scanning probe alignment accuracy.
- SNM two-page fact sheet for publication & EC public presentation
- Parallel closed loop lithography operation with 4 cantilever system demonstrated
- Second "SNM"-technology international workshop
- Report on the fabrication of a scaled MoS2 transistor with a sub-10 nm channel length
- SNM slide presentation for publication & EC public presentation
